Spinodal surface instability of soft elastic thin films

作     者：Shi Qing Huang Xi Qiao Feng 

作者机构：Department of Engineering MechanicsTsinghua University Beijing 100084 China 

出 版 物：《Acta Mechanica Sinica》 (力学学报（英文版）)

年 卷 期：2008年第24卷第3期

页      面：289-296页

核心收录：

学科分类：08[工学] 080501[工学-材料物理与化学] 0805[工学-材料科学与工程（可授工学、理学学位）] 

基　　金：the National Natural Science Foundation of China(10525210 and 10732050) 973 Project(2004CB619303) 

主　　题：Thin film Surface instability Surface energy van der Waals force 

摘      要：When the thicknesses of thin films reduce to microns or even nanometers, surface energy and surface interaction often play a significant role in their deformation behavior and surface morphology. The spinodal surface instability induced by the van der Waals force in a soft elastic thin film perfectly bonded to a rigid substrate is investigated theoretically using the bifurcation theory of elastic structures. The analytical solution is derived for the critical condition of spinodal surface morphology instability by accounting for the competition of the van der Waals interaction energy, elastic strain energy and surface energy. Detailed examinations on the effect of surface energy, thickness and elastic properties of the film show that the characteristic wavelength of the deformation bifurcation mode depends on the film thickness via an exponential relation, with the power index in the range from 0.749 to 1.0. The theoretical solution has a good agreement with relevant experiment results.