Controllable Synthesis of Well-aligned ZnO Nanorod Arrays on Varying Substrates via Rapid Electrodeposition

作     者：Haibao Zhang Shaowei Jin Guotao Duan Jingjing Wang Weiping Cai 

作者机构：Anhui Key Laboratory of Information Materials and DevicesSchool of Physics and Materials ScienceAnhui University Key Lab of Materials PhysicsInstitute of Solid State PhysicsChinese Academy of Sciences 

出 版 物：《Journal of Materials Science & Technology》 (材料科学技术（英文版）)

年 卷 期：2014年第30卷第11期

页      面：1118-1123页

核心收录：

学科分类：07[理学] 070205[理学-凝聚态物理] 08[工学] 080501[工学-材料物理与化学] 0805[工学-材料科学与工程（可授工学、理学学位）] 0702[理学-物理学] 

基　　金：supports of the project from the National Basic Research Program of China (973 Program,No.2011CB302103) the National Natural Science Foundation of China (Nos.11174001 and 11174286) the Natural Science Foundation of Anhui Province,China (No.11040606M62) 

主　　题：ZnO nanorods Electrodeposition Microstructural characterization Optical property X-ray diffraction 

摘      要：A facile and rapid electrodeposition route was developed to controllably synthesize well-aligned ZnO nanorod arrays on diverse substrates, such as seed-layer pre-formed, pristine indium tin oxide （ITO） and Si, using Zn（NO3）2·6H2O and hexamethylenetetramine （HMT） as the precursors. X-ray diffraction （XRD） and transmission electron microscopy （TEM） results indicated that seed-layer pre-modified of ZnO nanorod arrays （ZNRs） possessed single crystalline, a wurtzite crystal structure with preferential growth orientation along [0001] direction. The ZNRs on pre-modified ZnO seed-layer （ZSL） had diameters of 30-50 nm, and aligned vertically to the substrates. ZNRs on ZSL/ITO substrate exhibited a high transmittance （above 80%） in visible wavelength range and the red-shift of band gap energy. An electrochemical reaction model was proposed to explain the growth process of ZnO nanorods. Importantly, the rapid synthesis of ZNRs provided the feasibility of preparation of SERS （surface enhanced Raman scattering） nanocomposite within shorter time by a subsequent electrochemical etching.