PREPARATION AND SURFACE CHARACTERIZATION OF TiO2 THIN FILMS ON GLASS BY MAGNETRON SPUTTERING METHOD

作     者：L.S.Yin1,3), H. Shen2) and J.X. Zhang3) 1)College of Information Engineering, Central South University, Changsha 410075, China 2)Guangzhou Institute of Energy Conversion, CAS, Guangzhou 510070, China 3)Department of Physics, Zhongshan University, Guang 

作者机构：College of Information Engineering Central South University Changsha 410075 China 

出 版 物：《Acta Metallurgica Sinica(English Letters)》 (金属学报(英文版))

年 卷 期：2002年第15卷第2期

页      面：207-209页

核心收录：

学科分类：0817[工学-化学工程与技术] 0806[工学-冶金工程] 08[工学] 0807[工学-动力工程及工程热物理] 0805[工学-材料科学与工程（可授工学、理学学位）] 0802[工学-机械工程] 0703[理学-化学] 0811[工学-控制科学与工程] 

基　　金：The authors would like to thank the Hundred Talents Project of The Chinese Academy of Sciences Science and Technology Committ 

主　　题：TiO2. thin film. magnetron sputtering 

摘      要：Ti thin films were firstly deposited on glass substrates by magnetron sputtering method, then sintered the Ti thin films in air atmosphere and finally TiO2 transparence thin films on glass substrates were obtained. The structure and surface morphologies of the thin films were characterized by X-ray diffraction and SEM. The growth process of the thin films has been observed. The annealing time and annealing temperatures have an affect on the growth of the films.