Far-field superlens for nanolithography
Far-field superlens for nanolithography作者机构:National Key Laboratory of Micro/Nano Fabrication TechnologyKey Laboratory for Thin Film and Microfabrication Technology of Ministry of EducationResearch Institute of Micro/Nano Science and Technology Shanghai Jiao Tong University
出 版 物:《Chinese Physics B》 (中国物理B(英文版))
年 卷 期:2010年第19卷第3期
页 面:312-318页
核心收录:
学科分类:070207[理学-光学] 07[理学] 08[工学] 0803[工学-光学工程] 0702[理学-物理学]
基 金:Project supported by the Shanghai Committee of Science and Technology of China (Grant No. 0852nm06600) the National Natural Science Foundation of China(Grant No. 60808014)
主 题:far-field lithography superlens resolution
摘 要:A far-field optical lithography is developed in this paper. By designing the structure of a far-field optical superlens, lithographical resolution can be improved by using a conventional UV light source. The finite different time domain numerical studies indicate that the lithographic resolution at 50 nm line width is achievable with the structure shown in this paper by using 365 nm wavelength light, and the light can be transferred to a far distance in the photoresist.