Origin of magnetization-induced anisotropy of magnetic films

作     者：金汉民 Chong-Oh Kim Taek-Dong Lee Hyo-Jin Kim 

作者机构：Research Center for Advanced Magnetic MaterialsChungnam National University220Gung-dongYouseong-guDaejeon 305-764RO Korea Department of PhysicsJilin UniversityChangchun 130023China Department of Materials Science and EngineeringKorea Advanced Institute of Science and Technology373-1 Kusong-dongYouseong-guDaejeon 305-704RO Korea Department of Materials Science and EngineeringChungnam National University220Gung-dongYouseong-guDaejeon305-764RO Korea 

出 版 物：《Chinese Physics B》 (中国物理B（英文版）)

年 卷 期：2007年第16卷第11期

页      面：3520-3535页

核心收录：

学科分类：0809[工学-电子科学与技术（可授工学、理学学位）] 08[工学] 

基　　金：the Research Center of Advanced Magnetic Materials of Chungnam National University and Korea Research Foundation 

主　　题：magnetization-induced anisotropy magnetic film 

摘      要：It is proposed that the magnetization-induced anisotropy of magnetic films of cubic crystal structure originates from the anisotropy of atomic pair ordering, shape anisotropy, and strain anisotropy resulting from the constraint of the magnetostriction strain imposed on the film by the substratc. Calculated are the three anisotropy constants and their sum K vs temperature for Ni, Fe, and 55%Ni-Fe films; the room temperature （RT） constants vs the substrate temperature Tt during deposition or annealing after deposition for Ni and 50%Ni Co films; the RT constants vs com- position fraction for Fe-Ni films with Tt = RT, 250℃ and 450℃, Co Ni films at Tt = RT, 100℃ and 320℃, and Fe-Co films with Tt = RT and 300℃; the spread of RT K vs composition fraction for Fe Ni films; and RT △K/K vs composition fraction for Fe-Ni and Co Ni films, where △K denotes the variation of K of the film that is detached from its substrate. The calculated curves well accord with the measurements. The irrelevancy of K to the substrate material and the fast kinetics of the annealing in a field applied in the direction of the hard axis are explained reasonably.