In Situ Scanning-Tunneling-Microscope Observation on Dissolution of a Cu-20Zr Film

作     者：Haibo LU, Guoze MENG, Ying LI and Fuhui WANG State Key Laboratory for Corrosion & Protection, Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016, China 

作者机构：Laboratory for Corrosion and Protection Institute of Metal Research Chinese Academy of Sciences Shenyang 110016 China 

出 版 物：《Journal of Materials Science & Technology》 (材料科学技术（英文版）)

年 卷 期：2005年第21卷第3期

页      面：311-314页

核心收录：

学科分类：08[工学] 0805[工学-材料科学与工程（可授工学、理学学位）] 

基　　金：The authors gratefully acknowledge the financial support from the National Natural Science Foundation of China un-der contract No.50001013 

主　　题：Magnetron sputtering Film Potentiodynamic polarization ECSTM 

摘      要：A nanocrystalline coating of Cu-20Zr (in wt pct) was obtained on glass by magnetron sputtering. The corrosion behavior of the Cu-20Zr film in 0.001 mol/L HCI solution was investigated using potentiodynamic polarization and in situ electrochemical scanning-tunneling-microscopy (ECSTM). Results demonstrated that the film exhibits active behavior. Microscopic pitting corrosion and tunneling are caused by localized electrodissolution of Zr atoms and the diffusion of Cu atoms at surface defects.