Effect of Annealing Temperature on GMR of [NiFeCo(10 nm)/Ag(10 nm)]×20 Multilayer Film
Effect of Annealing Temperature on GMR of [NiFeCo(10 nm)/Ag(10 nm)]×20 Multilayer Film作者机构:Coll. of Mat. and Energy Guangdong Univ. of Technol. Guangzhou 510643 China
出 版 物:《Journal of Materials Science & Technology》 (材料科学技术(英文版))
年 卷 期:2004年第20卷第2期
页 面:179-181页
核心收录:
学科分类:0817[工学-化学工程与技术] 0806[工学-冶金工程] 08[工学] 0805[工学-材料科学与工程(可授工学、理学学位)] 0703[理学-化学] 0802[工学-机械工程] 0801[工学-力学(可授工学、理学学位)] 0702[理学-物理学]
基 金:This work was supported by the National Natural Science Foundation of China under grant No.59771026
主 题:Multilayer film Annealing GMR [NiFeCo(10 nm)/Ag(10 nm)]×20
摘 要:The composition, phase structure, and microstructure of the discontinuous multilayer films [NiFeCo(10 nm)/ Ag(10 nm)]×20 annealed at temperature 280, 320, 360 and 400℃, respectively were investigated. GMR (giant magnetore-sistance) ratios of the multilayer films were measured at different temperatures. The results showed that FeNi3 precipitated at 360℃ and dissolved at 400℃. The films annealed at 360℃ for 1 h exhibited the highest GMR ratio 11% when saturation field was equal to 79.6 kA/m.