Nanoparticle-based lift-off technique for ultra-thin nanoporous film preparation
Nanoparticle-based lift-off technique for ultra-thin nanoporous film preparation作者机构：National Key Laboratory of Nano/Micro Fabrication Technology Institute of Microelectronics Peking Uni-versity Beijing 100871 China
出 版 物：《Science in China(Series F)》 (中国科学（F辑英文版）)
年 卷 期：2008年第51卷第6期
页 面：819-824页
核心收录：
学科分类：07[理学] 070205[理学-凝聚态物理] 08[工学] 080501[工学-材料物理与化学] 0805[工学-材料科学与工程（可授工学、理学学位）] 0702[理学-物理学]
基 金：the National Natural Science Foundation of China (Grant Nos. 60606014 and 90607004)
主 题：nanoparticle lift-off nanoporous film
摘 要：Ultra-thin membrane with nanoscale through hole has great potential in biomedical applications, where precise controllability of porosity, pore size and film thickness is urgently required. The present work proposed a cost-effective way to prepare the ultra-thin nanoporous film with a promising controllability. Monodispersed nanoparticle, rather than photoresist, is used as the sacrificial material for this new lift-off process. By releasing the particles, holes can be achieved with predeter-mined characters. A 110 nm-thick nanoporous aluminum film with well-controlled pore＇s diameter was successfully fabricated to validate the technique. The technique has wider process window and better applicability than other nanofabrication methods.
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