Multi-channel micro neural probe fabricated with SOI

作     者：PEI WeiHua ZHU Lin WANG ShuJing GUO Kai TANG Jun ZHANG Xu LU Lin GAO ShangKai CHEN HongDa 

作者机构：Department of Biomedical EngineeringTsinghua UniversityBeijing 100084China State Key Laboratory on Integrated OptoelectronicsInstitute of SemiconductorsChinese Academy of SciencesBeijing 100083China 

出 版 物：《Science China(Technological Sciences)》 (中国科学（技术科学英文版）)

年 卷 期：2009年第52卷第5期

页      面：1187-1190页

核心收录：

学科分类：0810[工学-信息与通信工程] 08[工学] 0805[工学-材料科学与工程（可授工学、理学学位）] 081201[工学-计算机系统结构] 0702[理学-物理学] 0812[工学-计算机科学与技术（可授工学、理学学位）] 

基　　金：Supported by the National Basic Research Program of China ("973" Project) (Grant No. 2005CB724302) the National High-Tech Research and Development Program of China ("863" Project) (Grant Nos. 2007AA04Z329, 2007AA03Z427) the National Natural Science Foundation of China (Grant No. 60776024) 

主　　题：micro neural probe SOI impedance recording 

摘      要：Silicon-on-insulator(SOI) substrate is widely used in micro-electro-mechanical systems(MEMS).With the buried oxide layer of SOI acting as an etching stop,silicon based micro neural probe can be fabri-cated with improved uniformity and manufacturability.A seven-record-site neural probe was formed by inductive-coupled plasma(ICP) dry etching of an SOI *** thickness of the probe is 15 μ*** shaft of the probe has dimensions of 3 mm×100 μm×15 μm with typical area of the record site of 78.5 μ*** impedance of the record site was measured *** typical impedance characteris-tics of the record sites are around 2 MΩ at 1 *** performance of the neural probe in-vivo was tested on anesthetic *** recorded neural spike was typically around 140 μ*** from individual site could exceed 700 μ*** average signal noise ratio was 7 or more.