Ultrafast thermoelasticity modeling of microbump formation irradiated by femtosecond laser
Ultrafast thermoelasticity modeling of microbump formation irradiated by femtosecond laser作者机构:Shanghai Institute of Optics and Fine MechanicsChinese Academy of Sciences
出 版 物:《Chinese Optics Letters》 (中国光学快报(英文版))
年 卷 期:2008年第6卷第8期
页 面:619-621页
核心收录:
学科分类:080901[工学-物理电子学] 0809[工学-电子科学与技术(可授工学、理学学位)] 08[工学] 080401[工学-精密仪器及机械] 0804[工学-仪器科学与技术] 0803[工学-光学工程]
基 金:the Shanghai Science and Technology Committee (No.06SP07003 and 0652nm005) the National"973"Program of China (No.2006CB806000)
主 题:Elasticity Films Lasers Pulsed laser applications Thermoelasticity Thick films Ultrashort pulses
摘 要:Finite element method and ultrafast thermoelasticity model are combined to simulate the microbump formation irradiated by a femtosecond laser. It has been shown that the effect of microbump formation is related to the characteristic of incident femtosecond laser and the thermoelasticity properties of the film. The numerical results exhibit good agreements with the experimental results in both the shape and height of the conical microbump structure, which verify the effectiveness of the ultrafast thermoelasticity model in experiments. It should be helpful for selecting appropriate materials for nanotexturing of thin films by ultrafast lasers.