Pulsed DC plasma enhanced chemical vapor deposited TiN/Ti(C,N) multilayer coatings

作     者：马胜利 李雁淮 南俊马 徐可为 

作者机构：西安交通大学 金属材料强度国家重点实验室 陕西 西安 

出 版 物：《中国有色金属学会会刊：英文版》 (Transactions of Nonferrous Metals Society of China)

年 卷 期：2000年第10卷第4期

页      面：489-492页

核心收录：

学科分类：080503[工学-材料加工工程] 08[工学] 0805[工学-材料科学与工程（可授工学、理学学位）] 

基　　金：Project ( 715 -0 0 8-0 0 60 )supportedbytheNationalAdvancedMaterialsCommitteeofChinaandproject(DFXJU1999-7)supportedbytheDocto 

主　　题：PCVD TiN/Ti(C,N) multilayer coating microstructures properties 

摘      要：TiN single coatings and TiN/Ti(C,N) multilayer coatings deposited on Cr12MoV substrate have been completed by pulsed DC plasma enhanced chemical vapor deposition(PCVD) process. The SEM, XRD and microvicker’s hardness as well as the indentation test were used to study the microstructure and mechanical properties of TiN/Ti(C,N) multilayer coatings. The results show that TiN/Ti(C,N) coatings are fine and have free column structure, and carbon atoms take the place of some nitrogen atoms in Ti(C,N) coatings when lower flow ratio of CH 4 is used. The microvicker’s hardness and interfacial adhesion between TiN/Ti(C,N) coatings and Cr12MoV substrate increases more obviously than that of TiN single hard coatings due to the more dense and free column structure when process is optimized.