Thermal Annealing of Gold Thin Films on the Structure and Surface Morphology Using RF Magnetron Sputtering
作者机构：Division of Natural and Mathematical SciencesLemoyne-Owen CollegeMemphisTN 38126USA Sandia National LaboratoriesAlbuquerqueNM 87185USA Department of Electrical and Computer EngineeringPurdue UniversityWest LafayetteIN 47907USA
出 版 物：《材料科学与工程（中英文B版）》 (Journal of Materials Science and Engineering B)
年 卷 期：2018年第8卷第2期
页 面：66-76页
学科分类：06[历史学] 060207[历史学-专门史] 0602[历史学-中国史]
主 题：Gold annealing and magnetron sputtering
摘 要：Gold(Au)thin films were deposited on SiO2 substrate under argon(Ar)gas environment using RF(radio frequency)magnetron sputtering at room temperature for various deposition *** samples have been annealed at the temperature range of 250-450°*** change of the structural and surface morphological properties of both as-deposited and annealed films has been studied using an AFM(atomic force microscope),XRD(X-ray diffraction)and Raman *** improvement of crystallinity was observed at the annealing temperature of 350°C and degradation was found *** agreement with XRD and Raman measurements,both crystallite size and crystalline volume fraction were found to be increased having maximum at 350°C and decreased *** result can be explained by simple kinetic theory where sticking probabilities,Au structures agglomerated on SiO2 surfaces and surface coverage of Au atoms must be ***,it can also be explained by the occurrence of two competing phenomena like roughening induced grain growth and smoothing induced inhibition of grain growth with increasing annealing *** mechanisms are also discussed.
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