K-shell excitation dielectronic recombination resonance strengths of highly charged Helike to O-like Xe ions

作     者：Tianheng XU Gang XIONG Jun XIAO Yang YANG Roger HUTTON Yarning ZOU Ke YAO 徐天衡;熊刚;肖君;杨洋;Roger HUTTON;邹亚明;姚科

作者机构：Shanghai EBIT LaboratoryInstitute of Modem Physicsand Key Laboratory of Nuclear Physics and Ion-beam Application（MOE）Fudan UniversityShanghai 200433People＇s Republic of China Research Center of Laser FusionChina Academy of Engineering PhysicsMianyang 621900People＇s Republic of China 

出 版 物：《Plasma Science and Technology》 (等离子体科学和技术（英文版）)

年 卷 期：2018年第20卷第7期

页      面：72-76页

核心收录：

学科分类：08[工学] 081304[工学-建筑技术科学] 0805[工学-材料科学与工程（可授工学、理学学位）] 0827[工学-核科学与技术] 082701[工学-核能科学与工程] 0813[工学-建筑学] 0702[理学-物理学] 

基　　金：supported by the National Key Research and Development Program of China under Grant No.2017YFA0402300 

主　　题：dielectronic recombination (DR) electron ion beam trap (EBIT) 

摘      要：Dielectronic recombination is an important process in high temperature plasmas. In the present work, the KLn （n=L, M, N and O） DR resonance strengths of He-like to O-like xenon ions are measured at the Shanghai electron beam ion trap using a fast electron beam energy scanning method. The experiment uncertainty reaches about 6% with significant improvement of statistics. A relativistic configuration interaction calculation is also made. Theoretical results agree with the experiment results within 15% in most cases.