Fabrication and characterization of NiO films for energetic nano-multilayers by direct current reactive sputtering

作     者：Yi-Chao Yan Wei Shi Hong-Chuan Jiang Jie Xiong Wan-Li Zhang 

作者机构：State Key Laboratory of Electronic Thin Films and Integrated Devices University of Electronic Science and Technology of China 

出 版 物：《Rare Metals》 (稀有金属（英文版）)

年 卷 期：2018年第37卷第7期

页      面：594-598页

核心收录：

学科分类：07[理学] 0806[工学-冶金工程] 070205[理学-凝聚态物理] 08[工学] 080501[工学-材料物理与化学] 0805[工学-材料科学与工程（可授工学、理学学位）] 0703[理学-化学] 0702[理学-物理学] 

基　　金：financially supported by the Military Pre-Research fund(No.9140A12040412DZ02138) 

主　　题：NiO films Energetic nano-multilayers Thermal properties Volume ratio of oxygen to argon 

摘      要：NiO films were fabricated by reactive direct current magnetron sputtering on glass and alumina substrates for the application in energetic nano-multilayers. The structural and thermal properties of the films were investigated with the volume ratio of oxygen to argon ranging from 1：9 to 3：2, and the optimized ratio value is obtained as 1：3, which was confirmed by X-ray diffraction （XRD）, atomic force microscopy and ultrafast measure- ment system. The effect of the film thickness, varying from 150 to 900 nm, on the structural properties was characterized by XRD and scanning electron microscopy （SEM）. XRD analysis reveals that the （111） lattice plane is the preferred orientation. The intensities of preferential peaks and the grain sizes increase as the film thicknesses increase.