XPS STUDY OF ION IRRADIATED Cu/SiO_(2) INTERFACES
作者机构:Institute of PhysicsAcademia SinicaBeijing Institute of Aeronautical MaterialsMinistry of Aeronautics and AstronauticsBeijing
出 版 物:《Chinese Physics Letters》 (中国物理快报(英文版))
年 卷 期:1989年第6卷第3期
页 面:135-137页
核心收录:
学科分类:0202[经济学-应用经济学] 02[经济学] 020205[经济学-产业经济学]
主 题:irradiation interface bonded
摘 要:XPS study was carried out on Cu/SiO_(2) interface following the irradiation of 6.0MeV Siion *** chemical shift in the copper spectra reveals for the first time the existence of a chemically bonded structure in the interface region resulting from ion irradiation.