Design and fabrication of broadband ultralow reflectivity black Si surfaces by laser micro/nanoprocessing
作者机构:Department of Electrical and Computer EngineeringNational University of SingaporeSingapore 117576Singapore Institute of Materials Research and EngineeringAgency for ScienceTechnology and ResearchSingapore 117602Singapore NUS Environmental Research InstituteNational University of SingaporeSingapore 117411Singapore State Key Laboratory of Optical Technologies for MicrofabricationInstitute of Optics and ElectronicsChinese Academy of SciencesChengdu 610209China
出 版 物:《Light(Science & Applications)》 (光(科学与应用)(英文版))
年 卷 期:2014年第3卷第1期
页 面:147-154页
核心收录:
学科分类:080901[工学-物理电子学] 0809[工学-电子科学与技术(可授工学、理学学位)] 08[工学] 080401[工学-精密仪器及机械] 0804[工学-仪器科学与技术] 0803[工学-光学工程]
基 金:The authors would like to acknowledge financial support from the National Research Foundation,Prime Minister’s Office,Singapore under its Competitive Research Program(CRP Award No.NRF-CRP10-2012-04) the Economic Development Board(SPORE,COY-15-EWI-RCFSA/N197-1) The authors would also like to acknowledge funding provided by the Chinese Nature Science Grant(61138002)and 973 Program of China(No.2013CBA01700)
主 题:anti-reflection broadband laser micro/nanoprocessing surface plasmons
摘 要:Light collection efficiency is an important factor that affects the performance of many optical and optoelectronic *** these devices,the high reflectivity of interfaces can hinder efficient light *** minimize unwanted reflection,anti-reflection surfaces can be fabricated by micro/*** this paper,we investigate the fabrication of broadband anti-reflection Si surfaces by laser micro/*** direct writing is applied to create microstructures on Si surfaces that reduce light reflection by light *** addition,laser interference lithography and metal assisted chemical etching are adopted to fabricate the Si nanowire *** anti-reflection performance is greatly improved by the high aspect ratio subwavelength structures,which create gradients of refractive index from the ambient air to the ***,by decoration of the Si nanowires with metallic nanoparticles,surface plasmon resonance can be used to further control the broadband reflections,reducing the reflection to below 1.0%across from 300 to 1200 *** average reflection of 0.8%is achieved.