Structural stability of single-layered LaNi_4.25Al_0.75 film and its electro-chemical hydrogen-storage properties

作     者：WANG Zhongmin Chi Ying Vanessa Li ZHOU Huaiying Sammy Lap Ip Chan SHI Liu 

作者机构：Center of Material Science and Engineering Guilin University of Electronic Technology Guilin 541004 China School of Materials Science and Engineering University of New Sooth Wales Sydney NSW 2052 Australia Institute of Metal Research Chinese Academy of Sciences China 

出 版 物：《Rare Metals》 (稀有金属（英文版）)

年 卷 期：2006年第25卷第5期

页      面：543-548页

核心收录：

学科分类：0806[工学-冶金工程] 08[工学] 080501[工学-材料物理与化学] 0805[工学-材料科学与工程（可授工学、理学学位）] 0703[理学-化学] 0702[理学-物理学] 

主　　题：hydrogen storage thin film magnetron sputtering structural stability electrochemical properties 

摘      要：AB5-based hydrogen storage thin fdms （LaNi4.25Al0.75）, deposited on Cu substrate by dc magnetron sputtering were investigated in this study. X-ray diffraction （XRD） revealed that the microstructure of the layer was in crystal form. SEM and AFM analyses proved that the film appeared to be rather rough with numerous randomly sized pores of approximately 15-40 in nm diameter. Structural stability of the film was examined by the combined analyses of DSC, XRD, and SEM, which indicated that this film maintained its structural stability below 500 K or so, and a network structure was observed on the film after being heated at 700 K for 30 min. Electrochemical hydrogen-storage properties of the films were investigated by simulated battery tests. It was found that single-layered LaNi4.25A10.75 film exhibited electrochemical hydrogen-storage properties similar to typical AB5 alloys in bulk, and the maximum discharge capacity of the film was about 220 mAh/g. After 20 charge/discharge cycles, small needle-shaped aluminium oxide was formed on some fractions of the film surface.