Nanoindentation response analysis of TiN-Cu coating deposited by magnetron sputtering
Nanoindentation response analysis of TiN-Cu coating deposited by magnetron sputtering作者机构:School of Materials Science & Engineering Tianjin University Key Laboratory of Advanced Ceramics and Machining Technology of Ministry of Education Tianjin University Tianjin Key Laboratory of Advanced Joining Technology Tianjin University
出 版 物:《Progress in Natural Science:Materials International》 (自然科学进展·国际材料(英文))
年 卷 期:2018年第28卷第1期
页 面:40-44页
核心收录:
学科分类:080503[工学-材料加工工程] 08[工学] 0805[工学-材料科学与工程(可授工学、理学学位)]
基 金:financially supported by the National Natural Science Foundation of China(No.51375332) the Natural Science Foundation of Tianjin(No.16JCYBJC18700)
主 题:TiN-Cu coating Vacuum heat treatment Mechanical properties Nano-indentation depth
摘 要:To investigate the change of the mechanical properties of soft metals doped PVD(Physical Vapor Deposition)coatings after the migration of soft metal to the surface, TiN-Cu coating was deposited on Si(100) by magnetron sputtering. The microstructure and mechanical properties at room temperature and after vacuum heat treatment at 300 ℃ were investigated. The results showed that the grains were clustered and the microstructure was porous for TiN-Cu coating at room temperature, while many micro-and nano-sized Cu particles were observed on the surface after vacuum heat treatment at 300 ℃. The elastic properties of the TiN-Cu coating after vacuum heat treatment at 300℃ degraded compared with that at room temperature. The hardness and elasticity modulus of TiN-Cu coating kept constant(3.7 GPa and 125.0 GPa, respectively) with the increase of nano-indentation depth, while the hardness and elasticity modulus of TiN-Cu coating after vacuum heat treatment at 300 ℃ increased gradually.