A new approach for deposition of silver film from AgCl through successive ionic layer adsorption and reaction technique

作     者：Johnson Henry Arockiasamy Ajaypraveenkumar Ganesan Sivakumar Kannusamy Mohanraj 

作者机构：Department of Physics Manonmaniam Sundaranar University Tirunelveli-627 012 Tamil Nadu India CISL Department of Physics Annamalai University Annamalai nagar-608 002 Tamil Nadu India 

出 版 物：《Journal of Central South University》 (中南大学学报（英文版）)

年 卷 期：2017年第24卷第12期

页      面：2793-2798页

核心收录：

学科分类：07[理学] 070205[理学-凝聚态物理] 08[工学] 080501[工学-材料物理与化学] 0805[工学-材料科学与工程（可授工学、理学学位）] 0702[理学-物理学] 

基　　金：the DST-FIST and UGC-SAP New Delhi for providing the financial support to the Department of Physics Manonmaniam Sundaranar University 

主　　题：thin films metals materials characterization sol-gel optical properties silver 

摘      要：An attempt was made to deposit thin film of silver onto the glass substrate by using Ag Cl precursor, instead of conventional precursor AgNO_3 with vitamin C by inexpensive and convenient successive ionic layer adsorption and reaction(SILAR) method. The deposited silver thin film was characterized by X-ray diffraction(XRD) analysis, scanning electron microscope(SEM), UV-visible and electrical I-V study. The diffraction study showed FCC structure of metallic silver in good agreement with the standard values of JCPDS(04–0783). SEM reveals flower like nano particles produced on the substrate. The surface plasmon resonance(SPR) peak in the UV-visible spectrum shows maximum absorption at 350 nm. The film shows an ohmic behavior and its electrical resistivity was found ~103 ?·cm at room temperature.