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Measurement and Correction of K-Shell Ionization Cross Sections for Copper and Gallium by Electron Impact

测量和校正K-壳层电离截面的铜,镓电子碰撞

作     者:ZHOU Chang-Geng AN Zhu LUO Zheng-Ming 周长庚;安竹;罗正明

作者机构:Key Laboratory for Radiation Physics and Technology of Education MinistryInstitute of Nuclear Science and TechnologySichuan UniversityChengdu 610064 

出 版 物:《Chinese Physics Letters》 (中国物理快报(英文版))

年 卷 期:2001年第18卷第6期

页      面:759-760页

核心收录:

学科分类:07[理学] 070202[理学-粒子物理与原子核物理] 0702[理学-物理学] 

基  金:Supported by the Key Subject of Science and Technology of Education Ministry of China under Grant No.99202 

主  题:experiment. formally Electron 

摘      要:The K-Shell ionization cross sections of Cu and Ga are measured by electron impact and the data of Ga are reported for the first *** method of a thin chemical compound target with a thick substrate is formally used in the *** influence of electrons reflected from the substrate is corrected by means of a calculation of electron transport.

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