Nucleation Mechanism of Polycrystalline Diamond Film Deposited on Ceramic Alumina by Microwave Plasma Chemical Vapor Deposition

作     者：XIA Yi-ben MO Yao-wu WANG Yu HUANG Xiao-qin CHEN Da-ming WANG Hong 

作者机构：College of Materials Science and EngineeringShanghai UniversityShanghai 201800 

出 版 物：《Chinese Physics Letters》 (中国物理快报（英文版）)

年 卷 期：1996年第13卷第7期

页      面：557-560页

核心收录：

学科分类：081702[工学-化学工艺] 08[工学] 0817[工学-化学工程与技术] 

基　　金：Supported by the National Natural Science Foundation of China 

主　　题：ceramic microwave Diamond 

摘      要：Polycrystalline diamond films have been deposited on ceramic alumina substrates by microwave plasma chemical vapor deposition *** of the emission spectra in the microwave plasma with the microwave power and the vapor pressure in the reaction chamber is studied,*** between the hydrogen atomic spectra and the average energy of the electrons in the plasma,as well as the mechanism of diamond film deposition on ceramic alumina are discussed.