Measurement of Ion Parameters by Ion Sensitive Probe in ECR Plasma

作     者：谭必松 马志斌 沈武林 吴振辉 曹宏 汪建华 

作者机构：Province Key Laboratory of Plasma Chemistry and Advanced MaterialsSchool of Materials Science and EngineeringWuhan Institute of Technology 

出 版 物：《Plasma Science and Technology》 (等离子体科学和技术（英文版）)

年 卷 期：2011年第13卷第1期

页      面：68-72页

核心收录：

学科分类：07[理学] 070204[理学-等离子体物理] 0702[理学-物理学] 

基　　金：supported by National Natural Science Foundation of China (No. 10875093) 

主　　题：ion sensitive probe double Langmuir probe ECR plasma ion parameter vspatial distribution 

摘      要：Ion parameters in electron cyclotron resonance （ECR） microwave plasma were measured by ion sensitive probe and were compared with the electron parameters obtained by double Langmuir probe. The effects of gas pressure and microwave power on the ion temperature and density were analyzed. The spatial distribution of the ion parameters was also investigated by the ion sensitive probes with a tunable radial depth installed on different probe windows along the chamber axis. Results showed that the ion density measured by the ion sensitive probe was in good agreement with the electron density measured by the double Langmuir probe. The influ- ence of gas pressure on the ion parameters was stronger than that of microwave power. With the increase in working pressure, the ion temperature decreased monotonously with a decreasing rate larger than that at higher pressure. The ion density first increased to a peak （42.3~ 101~ cm-3） at 1 Pa and then decreased. The ion temperature and density increased little with the increase in the microwave power from 400 W to 800 W, The plasma far away from the resonant point is found to be radially uniform.