Measurement of OH Radicals in Dielectric Barrier Discharge Plasmas by Cavity Ring-Down Spectroscopy

作     者：赵国利 朱爱民 吴家婷 刘忠伟 徐勇 

作者机构：Laboratory of Plasma Physical Chemistry Dalian University of Technology Dalian 116024 China Laboratory of Materials Modification by Beams Dalian University of Technology Dalian 116024 China 

出 版 物：《Plasma Science and Technology》 (等离子体科学和技术（英文版）)

年 卷 期：2010年第12卷第2期

页      面：166-171页

核心收录：

学科分类：080901[工学-物理电子学] 0809[工学-电子科学与技术（可授工学、理学学位）] 08[工学] 

基　　金：supported by National Natural Science Foundation of China (Nos.10475015  10975029) 

主　　题：OH dielectric barrier discharge plasma cavity ring-down spectroscopy 

摘      要：Near-infrared continuous wave cavity ring-down spectroscopy was applied to mea- sure the OH radicals in dielectric barrier discharge plasmas, which play an important role in combustion systems, atmospheric chemistry and the removal of air pollutants by non-thermal plasmas. The P-branches of OH X2YIi （vI ： 2 ＋-- it 0） bands were used for number density measurements. The OH number density and plasma temperature were determined for different applied voltages, gas pressures and concentrations of both oxygen and water. The temporal evolu- tion of the OH number density was obtained by using the ＂time window＂ method, which was used to extract individual ring-down times at different times in a half period of the sine wave applied voltage in dielectric barrier discharge plasmas.