Investigation of thermal radiation effect on optical dome of sapphire coated yttrium oxide

作     者：Yuanchun Liu Zhiwei Hua Yurong He Jiaqi Zhu Jiecai Han 

作者机构：School of Energy Science and Engineering Harbin Institute ofTechnology Harbin 150001 China College of Aerospace Science and Engineering NationalUniversity of Defense Technology Changsha 410000 China School of Astronautics Harbin Institute of TechnologyHarbin 150001 China 

出 版 物：《Science Bulletin》 (科学通报（英文版）)

年 卷 期：2016年第61卷第10期

页      面：801-810页

核心收录：

学科分类：083002[工学-环境工程] 0830[工学-环境科学与工程（可授工学、理学、农学学位）] 07[理学] 08[工学] 09[农学] 080501[工学-材料物理与化学] 0903[农学-农业资源与环境] 0805[工学-材料科学与工程（可授工学、理学学位）] 0713[理学-生态学] 

基　　金：supported by the Foundation for Innovative Research Groups of the National Natural Science Foundation of China 国家自然科学基金 the Fundamental Research Funds for the Central Universities 

主　　题：Yttrium oxide Sapphire substrate Apparent emissivity Thermal radiation effect 

摘      要：Compared to traditional optical domes, domes of sapphire coated with films can effectively reduce emissivity and increase transmittance. The purpose of this work is to investigate the thermal radiation effect on sapphire optical dome coated with yttrium oxide by a radio frequency mag- netron sputtering method. The emissivity of sapphire coated with Y203 films is studied by both numerical and experi- mental methods. The results indicate that the emissivity of sapphire substrate is reduced effectively with increasing the thickness of the Y203 film. In addition, a finite element model is developed to simulate the radiation intensity of the optical dome. The thermal responses indicate that the max- imum temperature is reduced apparently compared with the uncoated sapphire as Y203 film thicknesses increase. The average irradiance distribution at different film thicknesses with time shows that the self-thermal radiation disturbance of sapphire optical dome delays 0.93 s when the thickness of Y203 film is 200μm, which can guarantee the dome works properly and effectively even in a harsh environment.