Synthesis of Anatase Titania Nanostructures at Room Temperature by PECVD Technique

作     者：K.M.K. Srivatsa Deepak Chhikara M. Senthil Kumar 

作者机构：Materials Physics and Engineering Division National Physical Laboratory Council of Scientific & Industrial Research (CSIR) Physics of Energy Harvesting Division National Physical Laboratory Council of Scientific & Industrial Research (CSIR) 

出 版 物：《Journal of Materials Science & Technology》 (材料科学技术（英文版）)

年 卷 期：2011年第27卷第8期

页      面：696-700页

核心收录：

学科分类：07[理学] 070205[理学-凝聚态物理] 08[工学] 080501[工学-材料物理与化学] 0805[工学-材料科学与工程（可授工学、理学学位）] 0702[理学-物理学] 

基　　金：project funded by the Department of Science & Technology (DST)  Govt. of India  for which authors gratefully acknowledge the support 

主　　题：Nanostructures Plasma enhanced chemical vapor deposition Anatase titania 

摘      要：titania nanostructures have been synthesized at room temperature by plasma enhanced chemical vapor deposition （PECVD） process on silicon （100） substrates using titanium tetraisopropoxide [Ti（OC3H7）4, TTIP] vapor, argon and oxygen mixtures under various deposition pressures. The deposited titania has been characterized for its structural, morphological and chemical composition by X-ray diffraction, scanning electron microscopy, energy dispersive X-ray （EDX） spectroscopy and Fourier transform infrared （FTIR） spectroscopy recordings. With the variation of deposition pressure, titania assumes various nanostructures viz. nanocrystals, nanoparticles, noanorods and comb-like structure. EDX and FTIR measurements show that the deposited titania is of high chemical purity. The possible growth mechanisms for the observed titania nanostructures have been discussed.