Numerical Simulation on the Production Mechanism of Surface-Wave Plasmas Sustained along a Metal Rod

作     者：ZHU Long-Ji CHEN Zhao-Quan YIN Zhi-Xiang WANG Guo-Dong XIA Guang-Qing HU Ye-Lin ZHENG Xiao-Liang ZHOU Meng-Ran CHEN Ming LIU Ming-Hai 

作者机构：College of Electrical and Information Engineering Anhui University of Science and Technology Huainan 232001 State Key Laboratory of Advanced Electromagnetic Engineering and Technology Huazhong University of Science and Technology Wuhan 430074 State Key Laboratory of Structural Analysis for Industrial Equipment Dalian University of Technology Dalian 116024 

出 版 物：《Chinese Physics Letters》 (中国物理快报（英文版）)

年 卷 期：2014年第31卷第3期

页      面：103-106页

核心收录：

学科分类：0810[工学-信息与通信工程] 080704[工学-流体机械及工程] 080103[工学-流体力学] 08[工学] 0807[工学-动力工程及工程热物理] 081001[工学-通信与信息系统] 0801[工学-力学（可授工学、理学学位）] 

基　　金：Supported by the National Natural Science Foundation of China under Grant Nos 11105002 and 61170172  the Open-end Fund of State Key Laboratory of Structural Analysis for Industrial Equipment under Grant No GZ1215  the Natural Science Foundation for University in Anhui Province of China under Grant No KJ2013A106  and the Open-end Fund of State Key Laboratory of Advanced Electromagnetic Engineering and Technology of Huazhong University of Science and Technology 

主　　题：Electromagnetic simulation 

摘      要：For interpreting the production mechanism of surface-wave plasmas sustained along a metal rod, electromagnetic simulation on the electromagnetic field distributions and particle-in-cell/Monte Carlo collision （PIC/MCC） simulation of the ionization process are present. The results show that the enhanced electric field of surface plasmon polaritons （SPPs） can be excited in the ion sheath layer between the negative-voltage metal rod and the surface-wave plasmas, which is responsible for maintaining the plasma discharge. Moreover, the spatio-temporal evolutions of plasma density and electric fields are simulated by the PIC/MCC model. It is further suggested that the expanded ion sheath layer can extend the length of plasma domain by increasing the plasma absorbed energy from SPPs.