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Hybrid metal-insulator-metal structures on Si nanowires array for surface enhanced Raman scattering

Hybrid metal-insulator-metal structures on Si nanowires array for surface enhanced Raman scattering

作     者:Kaichen Xu Chentao Zhang Tzu Hsiao Lu Puqun Wang Rui Zhou Rong Ji Minghui Hong 

作者机构:Department of Electrical and Computer Engineering National University of Singapore 4 Engineering Drive 3 117576 Singapore Data Storage Institute (A'STAR) Agency for Science Technology and Research 2 Fusionopolis Way 138634 Singapore Department of Mechanical and Electrical Engineering Xiamen University Xiamen 361005 China 

出 版 物:《光电工程》 (Opto-Electronic Engineering)

年 卷 期:2017年第44卷第2期

页      面:185-191页

核心收录:

学科分类:0808[工学-电气工程] 0809[工学-电子科学与技术(可授工学、理学学位)] 08[工学] 

基  金:financial support from A*STAR SERC 2014 Public Sector Research Funding (PSF) Grant (SERC Project No. 1421200080) 

主  题:surface-enhanced Raman scattering nanostructure fabrication plasmonics metal-insulator-metal 

摘      要:Surface enhanced Raman scattering(SERS)is an efficient technique to detect low concentration molecules.In this work,periodical silicon nanowires(Si NWs)integrated with metal-insulator-metal(MIM)layers are employed as SERS substrates.Laser interference lithography(LIL)combined with reactive ion etching(RIE)is used to fabricate large-area periodic nanostructures,followed by decorating the MIM layers.Compared to MIM disks array on Si surface,the SERS enhancement factor(EF)of the MIM structures on the Si NWs array can be increased up to 5 times,which is attributed to the enhanced electric field at the boundary of the MIM disks.Furthermore,high density of nanoparticles and nanogaps serving as hot spots on sidewall surfaces also contribute to the enhanced SERS signals.Via changing the thickness of the insulator layer,the plasmonic resonance can be tuned,which provides a new localized surface plasmon resonance(LSPR)characteristic for SERS applications.

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