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Atomic force microscopy investigation of growth process of organic TCNQ aggregates on SiO_2 and mica substrates

Atomic force microscopy investigation of growth process of organic TCNQ aggregates on SiO_2 and mica substrates

作     者:郇庆 胡昊 潘理达 肖江 杜世萱 高鸿钧 

作者机构:Institute of PhysicsChinese Academy of Sciences 

出 版 物:《Chinese Physics B》 (中国物理B(英文版))

年 卷 期:2010年第19卷第8期

页      面:270-275页

核心收录:

学科分类:08[工学] 0803[工学-光学工程] 

基  金:Project supported by the National Natural Science Foundation of China(Grant No.10774176) the National Basic Research Program of China(Grant No.2006CB806202) 

主  题:tetracyanoquinodimethane organic molecule deposition seahorse-like patterns 

摘      要:Deposition patterns of tetracyanoquinodimethane (TCNQ) molecules on different surfaces are investigated by atomic force microscopy. A homemade physical vapour deposition system allows the better control of molecule deposition. Taking advantage of this system, we investigate TCNQ thin film growth on both SiO2 and mica surfaces. It is found that dense island patterns form at a high deposition rate, and a unique seahorse-like pattern forms at a low deposition rate. Growth patterns on different substrates suggest that the fractal pattern formation is dominated by molecule-molecule interaction. Finally, a phenomenal "two-branch" model is proposed to simulate the growth process of the seahorse pattern.

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