Amine-containing film deposited in pulsed dielectric barrier discharge at a high pressure and its cell adsorption behaviours

作     者：胡文娟 谢芳艳 陈强 翁静 

作者机构：Laboratory of Plasma Physics and MaterialsBeijing Institute of Graphic Communication School of Basic Medical SciencesCapital Medical University 

出 版 物：《Chinese Physics B》 (中国物理B（英文版）)

年 卷 期：2009年第18卷第3期

页      面：1276-1282页

核心收录：

学科分类：08[工学] 080501[工学-材料物理与化学] 0805[工学-材料科学与工程（可授工学、理学学位）] 

基　　金：supported by the National Natural Science Foundation of China (Grant No 10775017) Funding Project for Academic Human Resources Development in Institutions of Higher Learning under the Jurisdiction of Beijing Municipality 

主　　题：pulsed DBD plasma high pressure allylamine cell adsorption behaviour 

摘      要：With monomer allylamine, amine-containing functional films were prepared in alternative current pulsed dielectric barrier discharge （DBD） at a high pressure. This paper analyses in detail the film properties and structures, such as hydrophilicity, compounds and microstructures as well as amine density by the water contact angle, Fourier transform infrared spectroscopy, atomic force microscopy, and ultraviolet-visible measurement. The influence of discharge param- eters, in particular applied power, on amine density was investigated. As an application the cell adsorption behaviours on plasma polymerization films was performed in-vitro. The results show that at a high pressure pulsed DBD plasma can polymerize films with sufficient amine group on surface, through which the very efficient cell adsorption behaviours was demonstrated, and the high rate of cell proliferation was visualized.