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Diagnosis of phasma in CCD damage process induced by laser

Diagnosis of phasma in CCD damage process induced by laser

作     者:Jian Lu, Xiao wu Ni, An-zhi He(Department of Applied Physics, Nanjing University of Science Technology, 200 Xiaolingwei, Nanjing 210014 ,China) 

出 版 物:《Chinese Journal of Lasers》 (中国激光(英文版))

年 卷 期:1993年第5期

页      面:81-85页

主  题:CCD device MOS structure laser damage optical breakdown plasma 

摘      要:In this paper, the shapes of plasma produced by a Q-switched YAG laser acted repeatedly upon a CCD with MOS structure are used, to investigate the destroying process of the optoelectronic device. The experimental results of CCD destroyed by a 1.06μm laser beam with a pulse width of 15 ns are given.

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