Work Function Enhancement of Indium Tin Oxide via Oxygen Plasma Immersion Ion Implantation
Work Function Enhancement of Indium Tin Oxide via Oxygen Plasma Immersion Ion Implantation作者机构:Department of Illuminating Engineering and Light SourcesInstitute for Electric Light SourcesFudan University
出 版 物:《Plasma Science and Technology》 (等离子体科学和技术(英文版))
年 卷 期:2013年第15卷第8期
页 面:791-793页
核心收录:
学科分类:07[理学] 070204[理学-等离子体物理] 0805[工学-材料科学与工程(可授工学、理学学位)] 0702[理学-物理学]
基 金:supported by National Natural Science Foundation of China(Nos.11005021 51177017 and 11175049)
主 题:plasma immersion ion implantation surface treatment work function indium tin oxide
摘 要:Indium tin oxide (ITO) transparent conducting film was treated with oxygen plasma immersion ion implantation (PIII). X-ray photoelectron spectroscopy (XPS) was employed to characterize the effect. The results suggested that the oxygen content in the surface was increased and maintained for more than 50 h compared with traditional plasma-treated samples. Meanwhile, the work function of ITO estimated by comparing the peak shift in the XPS diagram suggested a corresponding increase by more than 1 eV.