Fabrication of cost-effective, highly reproducible large area arrays of nanotriangular pillars for surface enhanced Raman scattering substrates

作     者：Kudilatt Hasna Aldrin Antony Joaquim Puigdollers Kumaran Rajeev Kumar Madambi Kunjukuttan Jayaraj 

作者机构：Nanophotonic & Optoelectronic Devices Laboratory Department of Physics Cochin University of Science & Technology Kochi 682 022 India Department of Instrumentation Cochin University of Science & Technology Kochi 682 022 India Department of Energy Science and Engineering Indian Institute of Technology Bombay Maharashtra 400 076 India Department of Enginyeria Electronica Universitat Politecnica Catalunya C/Jordi Girona 31 Modul C4 Barcelona 08034 Spain 

出 版 物：《Nano Research》 (纳米研究（英文版）)

年 卷 期：2016年第9卷第10期

页      面：3075-3083页

核心收录：

学科分类：081704[工学-应用化学] 080901[工学-物理电子学] 07[理学] 0809[工学-电子科学与技术（可授工学、理学学位）] 08[工学] 0817[工学-化学工程与技术] 080401[工学-精密仪器及机械] 070302[理学-分析化学] 0804[工学-仪器科学与技术] 0703[理学-化学] 0803[工学-光学工程] 

基　　金：supported by Spanish Ministry of Economy and Competitiveness by the Department of Science and Technology under the Nano Science and Technology Initiative 

主　　题：metal nanostructures localized surface plasmon resonance (LSPR) surface enhanced Ramanscattering (SERS) substrate enhancement factor 

摘      要：Development of cost-effective, highly reproducible non-conventional fabrication techniques for anisotropic metal nanostructures is essential to realizing potential applications of plasmonic devices, photonic devices, and surface enhanced Raman scattering （SERS） phenomenon based sensors. This report highlights the fabrication of nanotriangle arrays via nanoimprinting to overcome difficulties in creating large-area SERS active substrates with uniform, reproducible Raman signals. Electron beam lithography of anisotropic nanostructures, formation of arrays of nanotriangles in silicon and the transfer of triangular shapes to polymethylmethacrylate （PMMA） sheets via nanoimprinting have not been reported elsewhere. The reuse of silicon masters offers potential for production of low cost SERS substrates. The SERS activity and reproducibility of nanotriangles are illustrated and a consistent average enhancement factor of up to -2.9 × 1011, which is the highest value reported for a patterned SERS substrate, is achieved.