Surface Charging Controlling of the Chinese Space Station with Hollow Cathode Plasma Contactor

作     者：蒋锴 王先荣 秦晓刚 杨生胜 杨威 赵呈选 陈益峰 史亮 汤道坦 谢侃 

作者机构：Science and Technology on Vacuum Technology and Physics LaboratoryLanzhou Institute of Physics School of Aerospace Engineering Beijing Institute of Technology 

出 版 物：《Plasma Science and Technology》 (等离子体科学和技术（英文版）)

年 卷 期：2016年第18卷第7期

页      面：727-731页

核心收录：

学科分类：07[理学] 08[工学] 0805[工学-材料科学与工程（可授工学、理学学位）] 070204[理学-等离子体物理] 0825[工学-航空宇航科学与技术] 0702[理学-物理学] 

主　　题：active potential control hollow cathode space station plasma solar array 

摘      要：A highly charged manned spacecraft threatens the life of an astronaut and extravehicular activity, which can be effectively reduced by controlling the spacecraft surface charging. In this article, the controlling of surface charging on Chinese Space Station （CSS） is investigated, and a method to reduce the negative potential to the CSS is the emission electron with a hollow cathode plasma eontactor. The analysis is obtained that the high voltage （HV） solar array of the CSS collecting electron current can reach 4.5 A, which can be eliminated by emitting an adequate electron current on the CSS. The theoretical analysis and experimental results are addressed, when the minimum xenon flow rate of the hollow cathode is 4.0 sccm, the emission electron current can neutralize the collected electron current, which ensures that the potential of the CSS can be controlled in a range of less than 21 V, satisfied with safety voltage. The results can provide a significant reference value to define a flow rate to the potential controlling programme for CSS.