Halogen Bonding or Hydrogen Bonding between 2,2,6,6-Tetramethyl- piperidine-noxyl Radical and Trihalomethanes CHX3 (X=CI, Br, I)
2,2,6,6-四甲基哌啶氮氧自由基与卤仿形成卤键或氢键的理论研究作者机构:北京师范大学化学学院北京100875
出 版 物:《Chinese Journal of Chemical Physics》 (化学物理学报(英文))
年 卷 期:2013年第26卷第2期
页 面:172-180,I0003页
核心收录:
主 题:Halogen bonding Hydrogen bonding Theoretical study Nitroxide radical Natural bond orbital
摘 要:The halogen and hydrogen bonding complexes and trihalomethanes (CHX3, X=C1, Br, I) are between 2,2,6,6-tetramethylpiperidine-noxyl simulated by computational quantum chem- istry. The molecular electrostatic potentials, geometrical parameters and interaction energy of halogen and hydrogen bonding complexes combined with natural bond orbital analysis are obtained. The results indicate that both halogen and hydrogen bonding interactions obey the order CI〈Br〈I, and hydrogen bonding is stronger than the corresponding halogen bond- ing. So, hydrogen bonding complexes should be dominant in trihalomethanes. However, it is possible that halogen bonding complex is competitive, even preponderant, in triiodomethane due to the similar interaction energy. This work might provide useful information on specific solvent effects as well as for understanding the mechanism of nitroxide radicals as a bioprobe to interact with the halogenated compounds in biological and biochemical fields.