Effect of Substrate and Annealing Temperatures on Mechanical Properties of Ti-rich NiTi Films

作     者：A.Kumar S.K.Sharma S.Bysakh S.V.Kamat S.Mohan 

作者机构：Defence Metallurgical Research Laboratory Department of InstrumentationIndian Institute of Science Central Glass and Ceramics Research Institute 

出 版 物：《Journal of Materials Science & Technology》 (材料科学技术（英文版）)

年 卷 期：2010年第26卷第11期

页      面：961-966页

核心收录：

学科分类：07[理学] 070205[理学-凝聚态物理] 08[工学] 080501[工学-材料物理与化学] 0805[工学-材料科学与工程（可授工学、理学学位）] 0702[理学-物理学] 

基　　金：the support of Defence Research Development Organization under Project DMR-275 the support of the National Program on Smart Materials (NPSM) 

主　　题：NiTi thin film Annealing Nanoindentation 

摘      要：The effect of substrate and annealing temperatures on mechanical properties of Ti-rich NiTi films deposited on Si （100） substrates by DC magnetron sputtering was studied by *** films were deposited at two substrate temperatures viz.300 and 400 ℃.NiTi films deposited at 300 ℃ were annealed for 4 h at four different temperatures,i.e.300,400,500 and 600 C whereas films deposited at 400 ℃ were annealed for 4 h at three different temperatures,i.e.400,500 and 600 ℃.The elastic modulus and hardness of the films were found to be the same in the as-deposited as well as annealed conditions for both substrate *** a given substrate temperature,the hardness and elastic modulus were found to remain unchanged as long as the films were ***,both elastic modulus and hardness showed an increase with increasing annealing temperature as the films become *** results were explained on the basis of the change in microstructure of the film with change in annealing temperature.