Atomistic simulations of the effect of a void on nanoindentation response of nickel

作     者：ZHU PengZhe,HU YuanZhong & WANG Hui State Key Laboratory of Tribology,Tsinghua University,Beijing 100084,China 

作者机构：1. State Key Laboratory of Tribology Tsinghua University Beijing 100084 China 

出 版 物：《Science China(Physics,Mechanics & Astronomy)》 (中国科学：物理学、力学、天文学（英文版）)

年 卷 期：2010年第53卷第9期

页      面：1716-1719页

核心收录：

学科分类：08[工学] 080501[工学-材料物理与化学] 0805[工学-材料科学与工程（可授工学、理学学位）] 

基　　金：supported by the National Natural Science Foundation of China (Grant Nos 50730007 and 50721004) the State Key Development Program for Basic Research of China (Grant No 2009CB724200) 

主　　题：nanoindentation molecular dynamics simulations void 

摘      要：Three-dimensional molecular dynamics simulations have been performed to investigate the effect of a void on the nanoindentation of nickel thin *** radius and depth of the void are varied to explore how they influence the *** simulation results reveal that the presence of a void softens the material and allows for a larger indentation depth at a given load compared to the no void *** radius and depth of the void have a major effect on the indentation behaviors of the thin *** is also observed that the void will collapse during the nanoindentation of crystal with *** when the indentation depth is sufficiently large,the void will *** is found that the indentation depth needed to make the void disappear depends on the void size and location.