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EFFECTS OF DEPOSITION PROCESS ON PHOSPHORUS CONTENT IN ELECTROLESS Ni-P COATINGS

EFFECTS OF DEPOSITION PROCESS ON PHOSPHORUS CONTENT IN ELECTROLESS Ni-P COATINGS

作     者:QIAO Xueliang XU Weihua WU Yiping SUN Peizhen(Huazhong University of Science and Technology.Wuhan.China) 

作者机构:Huazhong Univ of Science and Technology Wuhan China 

出 版 物:《Acta Metallurgica Sinica(English Letters)》 (金属学报(英文版))

年 卷 期:1995年第8卷第2期

页      面:115-117页

核心收录:

学科分类:081702[工学-化学工艺] 08[工学] 0817[工学-化学工程与技术] 

主  题:electroless Ni-P coatings phosphorus deposition rate 

摘      要:There are many factors that affect the phosphorus content in the electroless Ni-P coatings The effects of the compositions of plating solution,the PH values of plat ing solution and the deposition temperature on the phosphorus content in Ni-P coatings were investigated in this paper It is found that the phosphorus content in Ni-P coatings increases and the deposition rate decreases with decreasing PH values,nickel sulphate NiSO4 content of plating solution and the deposition temperature.

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