PERFORMANCE AND MICROSTRUCTURE OF SUPERHARD Si_3N_4 FILM BY HIGH POWER CO_2 LASER CVD

作     者：FENG Zhongchao GUO Liang LIANG Yong HAN Jian HOU Wanliang NING Xiaoguang Institute of Metal Research,Academia Sinica,Shenyang,China Associate Professor,Institute of Metal Research,Academia Sinica,Shenyang 110015,China 

出 版 物：《Acta Metallurgica Sinica(English Letters)》 (金属学报（英文版）)

年 卷 期：1993年第6卷第7期

页      面：64-68页

核心收录：

学科分类：08[工学] 0805[工学-材料科学与工程（可授工学、理学学位）] 

主　　题：laser chemical vapour deposition Si_3N-4 film hardness wear resistance corrosion resistance 

摘      要：A superhard α-Si_3N_4 film,deposited on metal substrate,was produced by laser chemical vapor deposition adopting a kW-level high power CO_2 *** films are composed of fine Si_3N_4 *** join the metal substrate in strong *** films have super hardness,excellent resistance to wear and corrosion,*** thickness may be controlled within 5-30 μm.