Mechanism study on UV-induced photodegradation of nonylphenol ethoxylates by intermediate products analysis
Mechanism study on UV-induced photodegradation of nonylphenol ethoxylates by intermediate products analysis作者机构:School of Chemistry and Chemical Engineering Sun Yat-Sen University Guangzhou 510275 China Instrumental Analysis and Research Center Sun Yat-Sen University Guangzhou 510275 China
出 版 物:《Chinese Chemical Letters》 (中国化学快报(英文版))
年 卷 期:2007年第18卷第4期
页 面:473-475页
核心收录:
学科分类:083002[工学-环境工程] 083001[工学-环境科学] 0830[工学-环境科学与工程(可授工学、理学、农学学位)] 08[工学] 0703[理学-化学]
主 题:Photodegradation Nonylphenol ethoxylates Intermediate products Mechanism study
摘 要:Photodegradation of nonylphenol ethoxylates (NPloEO) was investigated in laboratory scale under UV irradiation. The intermediate photodegradation products were analyzed by LC-ESI-MS. Three kinds of intermediate products including aldehydic compounds, carboxylic compounds and cyclohexanyl compounds were identified. Five main degradation routes involving the oxidation of the alkyl chain and ethoxylate unit, shortening of the alkyl chain and ethoxylate unit, hydrogenation of the benzene ring were proposed.