Influences of deposition parameters on the microstructure and properties of nanostructural TiN films synthesized by filtered cathodic arc plasma

作     者：ZHANG Yujuan YAN Pengxun WU Zhiguo ZHANG Pingyu 

作者机构：Laboratory for Special Functional Materials Henan University Kaifeng 475001 China Department of Physics Lanzhou University Lanzhou 730000 China 

出 版 物：《Rare Metals》 (稀有金属（英文版）)

年 卷 期：2005年第24卷第4期

页      面：370-375页

核心收录：

学科分类：081704[工学-应用化学] 07[理学] 0806[工学-冶金工程] 08[工学] 0817[工学-化学工程与技术] 070205[理学-凝聚态物理] 080501[工学-材料物理与化学] 0805[工学-材料科学与工程（可授工学、理学学位）] 0703[理学-化学] 070301[理学-无机化学] 0702[理学-物理学] 

基　　金：This work was supported by the National Natural Science Foundation of China (No. 20571042) and the Natural Science Foundation of Henan University (No. 04YBRW056). 

主　　题：inorganic nonmetallic materials titanium nitride deposition nanostructure 

摘      要：Titanium nitride （TIN） films with nanostructure were prepared at ambient temperature on a （111） silicon substrate by the filtered cathodic arc plasma （FCAP） technology with an in-plane ＂S＂ filter. The effects of deposition parameters on the grain size, texture and nano-hardness of the films were systematically investigated. The grain size was obtained through calculation using the Scherrer formula and observed by TEM. The results of X-ray diffraction and electron diffraction indicated that increasing either negative substrate bias or argon flow promoted the formation of （111） preferred orientation. High argon flow leads to biaxial texture. The micro-hardness of the TIN films as a function of grain size showed a behavior according to the Hall-Petch relation under high argon flow.