Decomposition of aqueous chlorinated contaminants by UV irradiation with H2O2

作     者：Eunsung KAN Chang-II KOH Kyunghyuk LEE Joonwun KANG 

作者机构：Department of Molecular Bioscience and Bioengineering University of Hawaii Honolulu HI 96822 USA Department of Industrial Environment and Health Yonsei University Wonju 220-842 Korea 

出 版 物：《Frontiers of Environmental Science & Engineering》 (环境科学与工程前沿（英文）)

年 卷 期：2015年第9卷第3期

页      面：429-435页

核心收录：

学科分类：0821[工学-纺织科学与工程] 0830[工学-环境科学与工程（可授工学、理学、农学学位）] 081702[工学-化学工艺] 08[工学] 0817[工学-化学工程与技术] 082103[工学-纺织化学与染整工程] 

主　　题：H2O2/ultraviolet (OV) light advanced oxida- tion UV light irradiation chlorinated contaminants photochemical treatment characteristics 

摘      要：In the present study, the decomposition rates of carbon tetrachloride （CC14） and 2,4-dichlorophenol （2,4- DCP） in water by the ultraviolet （UV） light irradiation alone and H2O2AYV were experimentally investigated. The detailed experimental studies have been conducted for examining treatment capacities of the two different ultraviolet light sources （low and medium pressure Hg arc） in H2O2/UV processes. The low or medium UV lamp alone resulted in a 60%-90% decomposition of 2,4-DCP while a slight addition of H2O2 resulted in a drastic enhancement of the 2,4-DCP decomposition rate. The decomposition rate of 2,4-DCP with the medium pressure UV lamp alone was about 3-6 times greater than the low pressure UV lamp alone. In the direct photolysis of aqueous CC14, the medium pressure UV lamp had advantage over the low pressure UV lamp because the molar extinction coefficient of CC14 at shorter wavelength （210-220 nm） is about 20 to 50 times higher than that at 254 nm. However, adding H202 to the medium pressure UV lamp system rendered a negative oxidation rate because H202 acted as a UV absorber being competitive with CC14 due to negligible reaction between CC14 and OH radicals. The results fi：om the present study indicated significant influence of the photochemical properties of the target contaminants on the photochemical treatment characteristics for designing cost-effective UV-based degradation of toxic contaminants.