High and low frequency relaxation oscillations in a capacitive discharge plasma

作     者：周筑文 Sungjin Kim 吉世印 孙光宇 邓明森 

作者机构：Department of physics Guizhou Educational College Department of Electrical Engineering and Computer Sciences - 1770 University of California 

出 版 物：《Chinese Physics B》 (中国物理B（英文版）)

年 卷 期：2008年第17卷第10期

页      面：3799-3806页

核心收录：

学科分类：07[理学] 070204[理学-等离子体物理] 0702[理学-物理学] 

基　　金：Project supported by the Science Foundation of the Educational Bureau of Guizhou Province in China (Grant No ECS-2006215) the Lam Research Corporation the State of California MICRO Program National Science Foundation (Grant No ECS-0139956) a UC Discovery Grant from the Industry-University Cooperative Research Program (IUCRP) 

主　　题：relaxation oscillation capacitive discharge periphery slot 

摘      要：Both high and low frequency relaxation oscillations have been observed in an argon capacitive discharge connected to a peripheral grounded chamber through a slot with dielectric spacers. The oscillations, observed from time-varying optical emission of the main discharge chamber, show, for example, a high frequency （46 kHz） relaxation oscillation at 100 mTorr, with an absorbed power near the peripheral breakdown, and a low frequency （2.7-3.7 Hz） oscillation, at a higher absorbed power. The high frequency oscillation is found to ignite a plasma in the slot, but usually not in the periphery. The high frequency oscillation is interpreted by using an electromagnetic model of the slot impedance, combined with the circuit analysis of the system including a matching network. The model is further developed by using a parallel connection of variable peripheral capacitance to analyse the low frequency oscillation. The results obtained from the model are in agreement with the experimental observations and indicate that a variety of behaviours are dependent on the matching conditions.