Review of relaxation oscillations in plasma processing discharges

作     者：周筑文 M. A. Lieberman Sungjin Kimb 

作者机构：Department of Physics Guizhou Educational College Guiyang 550003 China Department of Electrical Engineering and Computer Sciences- 1770 University of CaliforniaBerkeley CA 94720 U.S.A 

出 版 物：《Chinese Physics B》 (中国物理B（英文版）)

年 卷 期：2007年第16卷第3期

页      面：758-765页

核心收录：

学科分类：08[工学] 0802[工学-机械工程] 080201[工学-机械制造及其自动化] 

基　　金：Project supported by the National Science Foundation of USA (Grant No ECS-0139956).Acknowledgments The authors wish to thank Professor A. J. Lichtenberg for many useful discussions and suggestions. They acknowledge the support provided by the Lam Research Corporation  the State of California MI- CR0 Program  National Science Foundation (Grant No ECS-0139956)  and a University of California Discovery (Grant from the Industry-University Cooperative Research Program (IUCRP). Professor Zhou Zhu-Wen performed this work as a visiting scholar in the Department of Electrical Engineering and Computer Sciences  University of California at Berkeley from May 2005 to May 2006 

主　　题：relaxation oscillation capacitive discharges inductive discharges plasma instability 

摘      要：Relaxation oscillations due to plasma instabilities at frequencies ranging from a few Hz to tens of kHz have been observed in various types of plasma processing discharges. Relaxation oscillations have been observed in electropositive capacitive discharges between a powered anode and a metallic chamber whose periphery is grounded through a slot with dielectric spacers. The oscillations of time-varying optical emission from the main discharge chamber show, for example, a high-frequency （- 40 kHz） relaxation oscillation at 13.33Pa, with an absorbed power being nearly the peripheral breakdown power, and a low-frequency （- 3 Hz） oscillation, with an even higher absorbed power. The high-frequency oscillation is found to ignite plasma in the slot, but usually not in the peripheral chamber. The kilohertz oscillations are modelled using an electromagnetic model of the slot impedance, coupled to a circuit analysis of the system including the matching network. The model results are in general agreement with the experimental observations, and indicate a variety of behaviours dependent on the matching conditions. In low-pressure inductive discharges, oscillations appear in the transition between low-density capacitively driven and high-density inductively driven discharges when attaching gases such as SF6 and Ar/SF6 mixtures are used. Oscillations of charged particles, plasma potential, and light, at frequencies ranging from a few Hz to tens of kHz, are seen for gas pressures between 0.133 Pa and 13.33 Pa and discharge powers in a range of 75 1200 W. The region of instability increases as the plasma becomes more electronegative, and the frequency of plasma oscillation increases as the power, pressure, and gas flow rate increase. A volume-averaged （global） model of the kilohertz instability has been developed; the results obtained from the model agree well with the experimental observations.