Tapered dielectric structure in metal as a wavelength-selective surface plasmon polariton focuser

作     者：张洋 赵清 廖志敏 俞大鹏 

作者机构：State Key Laboratory for Mesoscopic Physicsand Electron Microscopy LaboratorySchool of PhysicsPeking University 

出 版 物：《Chinese Physics B》 (中国物理B（英文版）)

年 卷 期：2009年第18卷第11期

页      面：4865-4869页

核心收录：

学科分类：070207[理学-光学] 07[理学] 0702[理学-物理学] 

基　　金：Project supported by the National Natural Science Foundation of China (Grant Nos 90606023, 10574003 and 20731160012) a National 973 Project (Grant No 2007CB936202 and 2009CB623703) MOST from China's Ministry of Science and Technology and Hong Kong's NSFC/RGC Joint Research Scheme (Project No N HKUST615/06) 

主　　题：tapered structure surface plasmon focusing finite-difference time-domain 

摘      要：Symmetric tapered dielectric structures in metal have demonstrated applications such as the nanofocusing of surface plasmon polaritons, as well as the waveguiding of V-channel polaritons. Yet the fabrication of smooth-surfaced tapered structure remains an obstacle to most researchers. We have successfully developed a handy method to fabricate metal-sandwiched tapered nanostructures simply with electron beam lithography. Though these structures are slightly different from conventional symmetric V-shaped structures, systematic simulations show that similar functionality of surface plasmon polariton nanofocusing can still be achieved. When parameters are properly selected, wavelength- selective nanofocusing of surface plasmon polaritons can be obtained.