Annealing time dependent structural, morphological, optical and electrical properties of RF sputtered p-type transparent conducting SnO_2/Al/SnO_2 thin films
退火时间对射频溅射p型透明SnO_2/Al/SnO_2导电薄膜结构、形貌、光学和电学性能的影响(英文)作者机构:School of Materials Science & Engineering Changwon National University Photovoltaic and Optoelectronic device center Korea Photonics Technology Institute
出 版 物:《Transactions of Nonferrous Metals Society of China》 (中国有色金属学报(英文版))
年 卷 期:2014年第24卷第S1期
页 面:129-133页
核心收录:
学科分类:080503[工学-材料加工工程] 07[理学] 070205[理学-凝聚态物理] 08[工学] 0806[工学-冶金工程] 0818[工学-地质资源与地质工程] 0815[工学-水利工程] 080501[工学-材料物理与化学] 0805[工学-材料科学与工程(可授工学、理学学位)] 0703[理学-化学] 0813[工学-建筑学] 0802[工学-机械工程] 0814[工学-土木工程] 0702[理学-物理学] 080201[工学-机械制造及其自动化]
基 金:Project(NIPA-2013-H0301-13-2009) supported by the MKE,Korea,under the ITRC support program supervised by the NIPA Project(2012HIB8A2026212) supported by the MEST and NRF through the Human Resource Training Project for Regional Innovation,Kored
主 题:pulsed laser deposition(PLD) transparent conducting oxide(TCO) p-type multi-layer transmittance
摘 要:Transparent p-type conducting SnO2/Al/SnO2 multilayer films were fabricated on quartz substrates by radio frequency(RF) sputtering using SnO2 and Al targets. The deposited films were annealed at a fix temperature of 500 °C for different time durations(1-8 h). The effect of annealing time on the structural, morphological, optical and electrical performances of SnO2/Al/SnO2 multilayer films was studied. X-ray diffraction(XRD) results show that all the p-type conducting films possess polycrystalline SnO2 with tetragonal rutile structure. Hall-effect results indicate that 500 °C for 1 h is the optimum annealing condition for p-type SnO2/Al/SnO2 multilayer films, resulting in a hole concentration of 1.14×1018 cm-3 and a low resistivity of 1.38 ?·cm, respectively. The optical transmittance of the p-type SnO2/Al/SnO2 multilayer films is above 80% within annealing time range of 1-8 h, showing maximum for the films annealed for 1 h.