Boring holes in Au nanoplates by active surface etching

作     者：Haiyang Hu Yuntao Wang Qian Wang Xudong Peng An Su Hong Wang Hongyu Chen 

作者机构：Institute of Advanced Synthesis(IAS)and School of Chemistry and Molecular EngineeringJiangsu National Synergetic Innovation Centre for Advanced MaterialsNanjing Tech UniversityNanjing 211816China Department of Environmental Science and EngineeringUniversity of Science and Technology of ChinaHefei 230026China Department of ChemistrySchool of Science and Key Laboratory for Quantum Materials of Zhejiang ProvinceResearch Center for Industries of the FutureWestlake UniversityHangzhou 310030China Institute of Natural SciencesWestlake Institute for Advanced StudyHangzhou 310024China 

出 版 物：《Nano Research》 (纳米研究（英文版）)

年 卷 期：2024年第17卷第9期

页      面：8610-8617页

核心收录：

学科分类：07[理学] 070205[理学-凝聚态物理] 08[工学] 080501[工学-材料物理与化学] 0805[工学-材料科学与工程（可授工学、理学学位）] 0702[理学-物理学] 

基　　金：the financial support from the National Natural Science Foundation of China(Nos.91956109,92356310,and 22075137) Zhejiang Provincial Natural Science Foundation of China:Major Program(No.2022XHSJJ002) Leading Innovative and Entrepreneur Team Introduction Program of Zhejiang(No.TD2022004) Foundation of Westlake University 

主　　题：Au nanoplates active surface etching boring etching mode cetyltrimethylammonium bromide(CTAB)passivation holes 

摘      要：In contrast to the conventional etching that makes nanoparticles rounder and our previous sharpening etching mode that causes serrated edges,here,we developed a new boring etching mode that targets the faces of Au nanoplates to make *** critical factors are the pre-incubation step with the ligand 2-mercapto-5-benzimidazolecarboxylic acid(MBIA)and the subsequent removal of excess ligands in the ***,etching is focused onto the few sites with initial loss of ligands,which cannot be quickly *** choice of ligand MBIA is also of importance,as it carries negative charge and repels each *** inability of forming a dense layer probably plays a critical role in the site-selectivity for faces,because ligands at the higher curvature edges and corners are expected to have less *** etching results from the comproportionation reaction between Au3+and Au0 in the nanoplates,where Br-coordination to Au and the extra stabilization from cetyltrimethylammonium bromide(CTAB)are *** believe that the ability of boring holes is an important tool for future synthetic designs.