咨询与建议

看过本文的还看了

相关文献

该作者的其他文献

文献详情 >Symmetrical fully-etched and c... 收藏

Symmetrical fully-etched and chirped beam splitter based on a subwavelength binary blazed grating

Symmetrical fully-etched and chirped beam splitter based on a subwavelength binary blazed grating

作     者:周唯 张华良 杨俊波 杨俊才 

作者机构:College of ScienceNational University of Defense Technology 

出 版 物:《Optoelectronics Letters》 (光电子快报(英文版))

年 卷 期:2012年第8卷第3期

页      面:182-185页

核心收录:

学科分类:0808[工学-电气工程] 0809[工学-电子科学与技术(可授工学、理学学位)] 08[工学] 0805[工学-材料科学与工程(可授工学、理学学位)] 0803[工学-光学工程] 0702[理学-物理学] 

基  金:supported by the National Natural Science Foundation of China (No.60907003) 

主  题:CMOS integrated circuits Optical instruments Prisms 

摘      要:A novel symmetrical chirped beam splitter based on a binary blazed grating is proposed, which adopts the fully-etched grating structure compatible with the current fabrication facilities for CMOS technology and convenient for integration and manufacture process. This structure can realize nearly equal-power splitting operation under the condition of TE polarization incidence. When the absolutely normal incidence occurs at the wavelength of 1580 nm, the coupling efficiencies of the left and the right branches are 43.627% and 43.753%, respectively. Moreover, this structure has the tolerances of 20 nm in etched depth and 3?in incident angle, which is rather convenient to manufacture facility.

读者评论 与其他读者分享你的观点

用户名:未登录
我的评分