A new fabrication method for enhancing the yield of linear micromirror arrays assisted by temporary anchors

作     者：Xingchen Xiao Ting Mao Yingchao Shi Kui Zhou Jia Hao Yiting Yu 

作者机构：Ningbo Institute of Northwestern Polytechnical UniversityCollege of Mechanical EngineeringNorthwestern Polytechnical University710072 Xi’anChina Key Laboratory of Micro/Nano Systems for Aerospace(Ministry of Education)Shaanxi Province Key Laboratory of Micro and Nanoelectromechanical SystemsNorthwestern Polytechnical University710072 Xi’anChina 

出 版 物：《Microsystems & Nanoengineering》 (微系统与纳米工程（英文）)

年 卷 期：2024年第10卷第3期

页      面：169-180页

核心收录：

学科分类：08[工学] 081201[工学-计算机系统结构] 0812[工学-计算机科学与技术（可授工学、理学学位）] 

基　　金：supported by the National Natural Science Foundation of China(51975483) Key Research Projects of Shaanxi Province(2020ZDLGY01-03) Natural Science Foundation of Ningbo Municipality(202003N4033) 

主　　题：mirror exceptional anodic 

摘      要：As one of the most common spatial light modulators,linear micromirror arrays(MMAs)based on microelectromechanical system(MEMS)processes are currently utilized in many ***,two crucial challenges exist in the fabrication of such devices:the adhesion of silicon microstructures caused by anodic bonding and the destruction of the suspended silicon film due to residual *** solve these issues,an innovative processing method assisted by temporary anchors is *** approach effectively reduces the span of silicon microstructures and improves the Euler buckling limit of the silicon ***,these temporary anchors are strategically placed within the primary etching areas,enabling easy removal without additional processing *** a result,we successfully achieved wafer-level,high-yield manufacturing of linear MMAs with a filling factor as high as 95.1%.Demonstrating superior capabilities to those of original MMAs,our enhanced version boasts a total of 60 linear micromirror elements,each featuring a length-to-width ratio of 52.6,and the entire optical aperture measures 5 mm×6 *** linear MMA exhibits an optical deflection angle of 20.4°at 110 Vdc while maintaining exceptional deflection flatness and *** study offers a viable approach for the design and fabrication of thin-film MEMS devices with high yields,and the proposed MMA is promising as a replacement for digital micromirror devices(DMDs,by TI Corp.)in fields such as spectral imaging and optical communication.