The role of ions in plasma catalytic carbon nanotube growth： A review

作     者：Erik C. Neyts 

作者机构：Research Group PLASMANT Department of Chemistry University of Antwerp Universiteitsplein 1 2610 Wilrijk-Antwerp Belgium 

出 版 物：《Frontiers of Chemical Science and Engineering》 (化学科学与工程前沿（英文版）)

年 卷 期：2015年第9卷第2期

页      面：154-162页

核心收录：

学科分类：081702[工学-化学工艺] 07[理学] 070205[理学-凝聚态物理] 08[工学] 0817[工学-化学工程与技术] 080501[工学-材料物理与化学] 0805[工学-材料科学与工程（可授工学、理学学位）] 0702[理学-物理学] 

主　　题：plasma-enhanced chemical vapor deposition(PECVD) carbon nanotube (CNT) ion bombardment,defect healing 

摘      要：While it is well-known that the plasma- enhanced catalytic chemical vapor deposition （PECVD） of carbon nanotubes （CNTs） offers a number of advantages over thermal CVD, the influence of the various individual contributing factors is not well understood. Especially the role of ions is unclear, since ions in plasmas are generally associated with sputtering rather than with growing a material. Even so, various studies have demonstrated the beneficial effects of ion bombardment during the growth of CNTs. This review looks at the role of the ions in plasma- enhanced CNT growth as deduced from both experimental and simulation studies. Specific attention is paid to the beneficial effects of ion bombardment. Based on the available literature, it can be concluded that ions can be either beneficial or detrimental for carbon nanotube growth, depending on the exact conditions and the control over the growth process.