A study of pulsed high voltage driven hollow-cathode electron beam sources through synchronous optical trigger
作者机构:Shanghai Aerospace Electronic Technology InstituteShanghai 201109People’s Republic of China School of Mechatronic Engineering and AutomationShanghai UniversityShanghai 200444People’s Republic of China School of Fundamental Physics and Mathematical SciencesHangzhou Institute for Advanced StudyUniversity of Chinese Academy of SciencesHangzhou 310024People’s Republic of China Key Laboratory of Gravitational Wave Precision Measurement of Zhejiang ProvinceTaiji Laboratory for Gravitational Wave UniverseHangzhou 310024People’s Republic of China Shanghai Aerospace Control Technology InstituteShanghai 201109People’s Republic of China
出 版 物:《Plasma Science and Technology》 (等离子体科学和技术(英文版))
年 卷 期:2024年第26卷第5期
页 面:82-90页
核心收录:
学科分类:080901[工学-物理电子学] 0809[工学-电子科学与技术(可授工学、理学学位)] 08[工学]
基 金:supported by National Natural Science Foundation of China(No.12102099) the National Key R&D Program of China(No.2021YFC2202700) the Outstanding Academic Leader Project of Shanghai(Youth)(No.23XD1421700),respectively
主 题:hollow-cathode nanosecond pulsed electron beam sources optical trigger pulsed high voltage supply beam current distribution
摘 要:In this study,a pulsed,high voltage driven hollow-cathode electron beam sources through an optical trigger is designed with characteristics of simple structure,low cost,and easy *** validate the new design,the characteristics of hollow-cathode discharge and electron beam characterization under pulsed high voltage drive are studied experimentally and discussed by discharge characteristics and analyses of waveform details,*** validation experiments indicate that the pulsed high voltage supply significantly improves the frequency and stability of the discharge,which provides a new solution for the realization of a high-frequency,high-energy electron beam *** peak current amplitude in the high-energy electron beam increases from 6.2 A to 79.6 A,which indicates the pulsed power mode significantly improves the electron beam ***,increasing the capacitance significantly affects the highcurrent,lower-energy electron beam more than the high-energy electron beam.